​​Ceramic Substrate Metallization​
  • ​​Ceramic Substrate Metallization​
  • ​​Ceramic Substrate Metallization​
​​Ceramic Substrate Metallization​
​​Ceramic Substrate Metallization​

Core Application Fields

1. Power Electronics (Dominant Market)

  • ​IGBT/DBC Modules​​:
    Copper-clad (120-300μm) alumina (Al₂O₃) or aluminum nitride (AlN) substrates support >1000A current with thermal conductivity >24W/(m·K). Key applications: EV power control and photovoltaic inverters.
  • ​IPM Modules​​:
    Metallization enables multi-chip interconnects, sustaining >150°C junction temperatures (e.g., Mitsubishi 7th-gen IPM uses AlN + copper pillar arrays).

2. RF/Microwave (High-Frequency Applications)

  • ​5G Base Station GaN PAs​​:
    Gold-plated (5-20μm) AlN substrates replace PCBs, reducing dielectric loss (tanδ <0.001) for 28/39GHz mmWave operation.
  • ​Phased Array Radar T/R Components​​:
    Beryllium oxide (BeO) metallization dissipates high power density while matching GaAs chip CTE (6.5ppm/K).

3. Optoelectronics & Sensing (Precision Interconnects)

  • ​Laser BAR Bonding​​:
    Au-Sn eutectic bonding on ceramic carriers achieves <0.3K/W thermal resistance (e.g., TRUMPF 3kW semiconductor lasers).
  • ​MEMS Pressure Sensors​​:
    Zirconia (ZrO₂) metallized sealing rings enable wafer-level hermeticity (<10⁻⁸ mbar·L/s leak rate).

4. Advanced Packaging (Emerging Frontier)

  • ​Automotive LiDAR​​:
    LTCC substrates with silver paste metallization integrate transceiver modules (CTE mismatch <2ppm/°C).
  • ​Quantum Computing Chips​​:
    Superconducting circuits on metallized Al₂O₃ substrates (surface roughness <50nm) minimize microwave loss.

Technical Value Proposition

Metallized layers achieve >50N/mm Cu-ceramic bond strength* through microstructure control (e.g., Mo-Mn transition layers). Maintains electrical stability across -55°C to 850°C thermal cycling, providing foundational reliability for extreme-environment systems.

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